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?GFC系列高性能全自動真空鍍膜機(jī)
  • 用途及特點(diǎn)
  • 規(guī)格參數(shù)
    用途及特點(diǎn)
    Use and Features
     
    ●適應(yīng)于玻璃、塑膠等基片上鍍制各類光學(xué)薄膜和其它機(jī)能性裝飾薄膜的批量化生產(chǎn)
    ●采用******的電氣控制系統(tǒng),良好的用戶操作界面,大大減輕作業(yè)人員的負(fù)擔(dān)
    ●RCS自動鍍膜控制系統(tǒng)******整個鍍膜過程自動完成
    ●基片架轉(zhuǎn)動采用磁流體密封技術(shù)******真空密封,中心驅(qū)動方式******薄膜產(chǎn)品的均勻性及重復(fù)性
    ●優(yōu)化的配置、嚴(yán)格的品質(zhì)控制******產(chǎn)品質(zhì)量的穩(wěn)定性和重復(fù)性
    ●排氣速率.鍍膜效率的提高,大大縮短了產(chǎn)品生產(chǎn)周期
    GFC系列高性能全自動真空鍍膜機(jī)
    Series GFC High Quality Vacuum Thin Film Coater
    技術(shù)參數(shù)
    Technical parameters
    真空室體
    Vacuum chamber
    Ø1300*1450mm,SUS304材質(zhì)
    φ1,300*1,450mm,SUS304 material
     
    排氣系統(tǒng)
    Air exhaust system
    KT-500擴(kuò)散泵2臺,總排氣速率(加載水冷阱)11,000Pa.L/S
    Two sets of KT-500 diffusion pump, with a gross exhaust velocity (loaded with water-cooling trap) of 11,000Pa.L/S;
    極限真空≤2.0E-4Pa;排氣時間≤15min(大氣→4.0E-3Pa)
    Ultimate vacuum ≤2.0E-4Pa; exhaust time ≤15min (atmosphere→4.0E-3Pa)
    基片架
    Substrate holder
    Ø1200四葉扇形基片架, 3~30rpm轉(zhuǎn)速;可選配行星基片架、翻轉(zhuǎn)機(jī)構(gòu)等
    φ1200 four-blade sector-shaped substrate holder, rotating speed 3~30rpm; a planet substrate holder or a turnover mechanism can also be matched;
    加熱機(jī)構(gòu)
    Heating means
    ******350℃,PID控制;恒溫20min后溫度均勻性250±10℃
    Maximum 350℃, PID control; temperature homogeneity being 250±10℃ after 20 min of constant temperature control;
    石英監(jiān)控儀
    Quartz monitor
    進(jìn)口石英晶體膜厚監(jiān)控儀;2點(diǎn)(或6點(diǎn))晶振探頭
    Imported quartz crystal monitor on film depth, with two-point (or six-point) crystal probe;
    電子束蒸發(fā)源
    Electron beam evaporation source
    10KW電子槍 2臺,12點(diǎn)坩堝和環(huán)形坩堝
    Two sets of 10KW electron gun, 12-point crucible or ring-shaped crucible;
    電阻蒸發(fā)源
    Resistance evaporation source
    功率4KW(一對、兩對或多對)
    Power of 4KW (one pair, two pairs or more pairs)
    膜厚修正板
    Film depth correction board
    2個自動可倒式膜厚修正機(jī)構(gòu)
    Two automatic film depth correction mechanisms of collapsible type
    反應(yīng)氣體
    Reaction gas
    APC自動壓強(qiáng)控制儀,質(zhì)量流量計(jì)
    APC automatic pressure controller, mass flowmeter
    離子源
    Ion source
    可選配Kafman、Holl或RF離子源
    Available for matching of Kafman, Holl or RF ion source
    低溫抽氣裝置
    Low temperature evacuating equipment
    進(jìn)口低溫抽氣裝置有效捕集水蒸汽,******溫度-130℃
    The imported low-temperature evacuating equipment can effectively gather water vapor; minimum temperature -130℃
    RCS系統(tǒng)
    RCS system
    基于WINDOWS的全自動鍍膜軟件
    Windows-based full automatic coating software
    控制系統(tǒng)
    Control system
    控制柜(液晶觸摸式彩色顯示器),遠(yuǎn)程控制遙控盒
    Control cabinet (with liquid crystal color touch screen), remote-control box for remote control
     
    消耗能源
    Energy consumption
    3相,220/380VAC,50Hz;~70KVA
    Three-phase, 220/380VAC,50Hz;~70KVA
    水流量140L/min,壓力0.3~0.5MPa
    Water flow 140L/min, pressure 0.3~0.5MPa
    壓縮空氣0.5MPa~0.7MPa
    Compressed air 0.5MPa~0.7MPa
    重    量
    Weight
    凈重約4500Kg
    Net weight about 4,500 Kg
    安裝空間
    Installation space
    W4000mmxD6000mmxH2700mm
    W4,000mm×D6,000mm×H2,700mm
     

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